高K栅介质电荷俘获行为的脉冲特性分析（英文）

High dielectric constant (high κ) gate materials, such as hafnium oxide (HfO2), zirconium oxide (ZrO2), alumina (Al2O3), and their silicates1, have drawn a great deal of attention in recent years as potential materials for gate dielectrics in advanced CMO



相关下载